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Invitation


Entrance gate to INPE

INPE Campus

Chromium plasma by MS
In continuation to a sequence of international meetings started in 1993,the Organizing Committee of the International Workshop on Plasma-Based Ion Implantation and Deposition (PBII&D) welcomes you to participate in the 10th Workshop to be held in So Jos dos Campos, SP, Brazil, from 7 to11 September, 2009.
Taking place every two years and attended by internationally recognized experts, the PBII&D Workshop is the longest standing and most respected international meeting devoted to plasma-based processing technologies.

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The objective of the 10th International Workshop on Plasma Based Ion Implantation and Deposition (PBII&D 2009) is to provide a fruitful forum for cross-disciplinary exchange of the latest scientific results in areas encompassing materials engineering, plasma implantation technology, surface modification of materials, semiconductor doping technologies, surface physics and pulsed power physics and engineering.


Rio de Janeiro

Igua Falls

Ubatuba beach

Ubatuba beach
Latest News
Arriving in Brazil

General Information for Presenters

Publication of the 10th PBII&D Proceedings

Programme at a glance

Conference Programme

List of Abstracts

Conjoined Conference

Confirmed Invited Speakers

By using the Elsevier Editorial System (EES), electronic version of the manuscripts should be submitted no later than 8 September, 2009.

(See Proceedings Publication).
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